E12900 - SEMI E129 - Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility Revision:SEMI E129-0709 - Superseded 4 This Standard defines preparation

4 This Standard defines preparation and pretreatment procedures used for the evaluation of liquid chemical distribution system materials in a test fluid

本スタンダードは，global Silicon Wafer Committeeで技術的に承認されている。現版は2010年1月20日，global Audits and Reviews Subcommitteeにて発行が承認された。2010年2月にwww

This Test Method provides detailed procedures for characterizing silicon wafers GOI using the TZDB method

1  The scope of this Standard is grades of hydrofluoric acid used in the semiconductor industry

E12900 - SEMI E129 - Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility Revision:SEMI E129-0709 - Superseded 4 This Standard defines preparationThe purpose of this Guide is to minimize the negative impact on productivity caused by static charge and electric fields in semiconductor manufacturing environments. It is a guide for establishing electrostatic compatibility in facilities used for semiconductor manufacturing. Electrostatic compatibility of production equipment is addressed in SEMI E78. Electrostatic surface charge causes a number of undesirable effects in semiconductor manufacturing