E19500 - SEMI E195 - Test Method Using Adhesive Replacement Substrates to Assess Particulate Surface Contamination on Critical Chamber Components StdTpc-Wafer Shipping System This test method was technically

This test method was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee

SEMI P44-0709 (technical revision)

This Test Method describes standard procedures for metal oxide semiconductor (MOS) capacitor fabrication

It is expected that applications will be written to organize and present this information to human users in a form that is easier for end users to digest

E19500 - SEMI E195 - Test Method Using Adhesive Replacement Substrates to Assess Particulate Surface Contamination on Critical Chamber Components StdTpc-Wafer Shipping System This test method was technically1 Purpose 1. 1 This Test Method describes a quantitative analysis method to measure the ISO 14644 9 surface cleanliness for particle concentration (SCP) of a critical chamber component (CCC) by means of an adhesive replacement substrate (ARS), which removes particles from the CCC surfaces of interest. The ARS is subsequently measured with a scanning surface inspection system (SSIS), typically a scatterometer, for particle counting, and with scanning