F11600 - SEMI F116 - Guide for Drain Segregation for Semiconductor Manufacturing Tools to Support Site Water Reuse Revision:SEMI F116-0821 - Current Values of the image obtained

Values of the image obtained using this method are reported in Ra

The purpose of this Specification is to define standard criteria for the alphanumeric marking of round compound semiconductor wafers

and shipping documentation

本仕様は，注記されているところを除き，ISO/IEC 18000-02と互換性がある。本仕様は，半導体デバイスおよび集積回路の製造用途に，この規格を拡張し，特化するものである。

F11600 - SEMI F116 - Guide for Drain Segregation for Semiconductor Manufacturing Tools to Support Site Water Reuse Revision:SEMI F116-0821 - Current Values of the image obtainedThis Guide provides definitions and recommendations for design of drain segregation to enable water reuse in a semiconductor manufacturing facility. It is intended to establish a common basis for developing design specifications and decisions concerning planning and design of water reuse systems. This Guide also includes implications for the water reclamation and reuse systems configurations. This Guide is recommended to be used by semiconductor