T01600 - SEMI T16 - 極紫外線マスク自動識別用データマトリクス記号法適用の仕様 Revision:SEMI T16-0706 - Superseded SEMI M40 — Guide for

SEMI M40 — Guide for Measurement of Roughness of Planar Surfaces on Silicon Wafers

The accuracy of the critical dimensions of the notch controls the possible accuracy of the alignment

1e12-1e13 C atoms/cm2

TSVにとって重要な計測に関する問題の理解と議論を行うための一貫した用語を規定することである。

T01600 - SEMI T16 - 極紫外線マスク自動識別用データマトリクス記号法適用の仕様 Revision:SEMI T16-0706 - Superseded SEMI M40 — Guide forNotice: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI global Traceability Committee2006516global Audits and Reviews Subcommittee20066www. semi. org200511 EUV SEMI P37SEMI P386 6 Referenced SEMI Standards SEMI P37 Specification for Extreme Ultraviolet Lithography Mask Substrates SEMI P38