F06200 - SEMI F62 - 周囲およびガス温度の影響からマスフローコントローラ性能特性を決定する試験方法 Revision:SEMI F62-0701 (Reapproved 1111) - Superseded quantifies the near-edge curvature of

quantifies the near-edge curvature of wafers used in semiconductor device processing

1  This Test Method presents a procedure for measuring step heights of thin films using step height test structures

This Specification defines the dimensions of container (refer to ¶ 5

Referenced SEMI StandardsSEMI M1 — Specifications for Polished Single Crystal Silicon Wafers

F06200 - SEMI F62 - 周囲およびガス温度の影響からマスフローコントローラ性能特性を決定する試験方法 Revision:SEMI F62-0701 (Reapproved 1111) - Superseded quantifies the near-edge curvature ofglobal Gases Technical Committee2011912global Audits and Reviews Subcommittee201111www. semiviews. org www. semi. org2001720073 : MFCMFC Referenced SEMI Standards None.