P02300 - SEMI P23 - Guidelines for Programmed Defect Masks and Benchmark Procedures for Sensitivity Analysis of Mask Defect Inspection Systems Lang-Korean The purpose of this Test

The purpose of this Test Method is to specify methods for the contactless measurement of the resistivity of semi-insulating samples and wafers

1  This Standard specifies the classes that suppliers are to use to describe essential data

この仕様の目的は，SEMI E23に規定されたパラレルI/Oのインタフェースの能力を向上させることであり，これはキャリア搬送の信頼性および効率の向上をサポートするためである。向上される能力が含むものは，連続移載，同時移載，インタフェース上のエラー検出能力である。

SEMI C30 — Specification and Guide for Hydrogen Peroxide

P02300 - SEMI P23 - Guidelines for Programmed Defect Masks and Benchmark Procedures for Sensitivity Analysis of Mask Defect Inspection Systems Lang-Korean The purpose of this TestThis standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 5, 2007. It was available at www. semi. org in October 2007. Originally published in 1993; previously published in February 2000. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive