E07800 - SEMI E78 - Guide to Assess and Control Electrostatic Discharge (ESD) and Electrostatic Attraction (ESA) for Equipment Revision:SEMI E78-0706 - Superseded SEMI T9 — Specification for

SEMI T9 — Specification for Marking of Metal Lead-Frame Strips with a Two-Dimensional Data Matrix Code Symbol

but the precision estimate was taken from data on chemical-mechanical polished surfaces

SEMI C56-0224 (technical revision)

This method can also be used for other applications outside of microelectronics

E07800 - SEMI E78 - Guide to Assess and Control Electrostatic Discharge (ESD) and Electrostatic Attraction (ESA) for Equipment Revision:SEMI E78-0706 - Superseded SEMI T9 — Specification forThe purpose of this Guide is to minimize the negative impact on productivity caused by static charge and electric fields in semiconductor manufacturing equipment. It is a guide for establishing electrostatic compatibility of equipment used in semiconductor manufacturing. Electrostatic compatibility in the entire semiconductor factory is addressed in SEMI E129. Electrostatic surface charge causes a number of undesirable effects in semiconductor