M07600 - SEMI M76 - 開発用直径450 mmシリコン単結晶鏡面ウェーハの仕様 Revision:SEMI M76-0710 - Inactive SEMI S2-0724 (technical revision)
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Description
SEMI S2-0724 (technical revision)
It also provides for standardized communication with lithography
標準化走査個所パターン
SEMI MF1727 defines the procedures for oxidation of the wafer prior to etching
M07600 - SEMI M76 - 開発用直径450 mmシリコン単結晶鏡面ウェーハの仕様 Revision:SEMI M76-0710 - Inactive SEMI S2-0724 (technical revision)NOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI global Silicon Wafer Committee2010430global Audits and Reviews Subcommittee20106www. semi. org 450 mmIC450 mm 450 mm 450 mmAMHS450 mm450 mmSEMI M74 SI (System International Referenced SEMI Standards SEMI E45 Test Method for the
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