Al2O3 - Sapphire Wafer, C-plane (0001), 10x10x0.25mm, 1SP ALC1010025S1 High-Throughput Coating Two pushing rods highly polished

Two pushing rods highly polished and perfectly fitted into die

MTI supplies high quality hot pressed SiC cutting blades with 8" diameter x 0

a major advantage over other compressing jigs where the clamping force of the split cell weakens once the mechanical jack loses pressure

2" larger diameter Alumina tube is made with high purity Al2O3 material

Al2O3 - Sapphire Wafer, C-plane (0001), 10x10x0.25mm, 1SP ALC1010025S1 High-Throughput Coating Two pushing rods highly polishedFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 10 x 10 x 0. 25(+ 0. 05) mm thick Orientation: <0001> + 0. 5o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A one side polished Package: Each wafer is packed in 1000 class clean room with 100 grade plastic