Al2O3 - Sapphire Wafer 3" x0.5 mm, A plane (11-20), 1 SP - ALA76D05C1US Al Width: 300mm

Width: 300mm

Kerr's Research Group from the Lawrence Berkeley National Laboratory (LBL)

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Fabrication Method: Electrodeposition of Silver on Nickel Foam Substrate

Al2O3 - Sapphire Wafer 3" x0.5 mm, A plane (11-20), 1 SP - ALA76D05C1US Al Width: 300mmFeatures: A plane (11 20) sapphire wafer is being used extensively as a substrate for III V nitrides and magnetic epitaxial films due to its better lattice mismatch Wafer size: 3" dia x 0. 5 mm thickness Orientaion: A plane <11 20> ori.(+ 05o) with Standard Flat Polished surface: Wafer surface is EPI polished via a special CMP procedure Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container Typical