Corrosion of metals and alloys. Corrosion fatigue testing - Crack propagation testing using precracked specimens algolia-ignore Annex B was removed because
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Description
Annex B was removed because there are already procedures for circuit board assemblies
The areic dose of the ion-implanted analyte retained in the WoRM wafer is certified against the areic dose of the same analyte retained in an ion-implanted silicon wafer having the status of a (preferably certified) secondary reference material (SeRM)
BS EN 62416 specifies the hot carrier test method and test procedure of MOS transistors used in semiconductor devices
with the exception of checks
Corrosion of metals and alloys. Corrosion fatigue testing - Crack propagation testing using precracked specimens algolia-ignore Annex B was removed because
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