Al2O3 - Sapphire Wafer, (10-14), 10x10x0.5mm, 1 SP - AL1014ori101005S1 High-Throughput Coating Maximum power: 6 kW

Maximum power: 6 kW

Target  A-Z

Temperature control console provides up to 30 segments programmable with +/- 1 ºC accuracy

445mm(L) x 380mm(D) x 135mm(H)

Al2O3 - Sapphire Wafer, (10-14), 10x10x0.5mm, 1 SP - AL1014ori101005S1 High-Throughput Coating Maximum power: 6 kWFearures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 10 x 10 x 0. 5 mm thick Orientation: (10 14) + 0. 5o Polished surface: Substrate surface is EPI polished via a special CMP procedure with RA < 5 A 1 side polished Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with