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Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy Ingestion-build-48068 intended to be used together
Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy Ingestion-build-48068 intended to be used together
$116.00
Description
intended to be used together with ISO 4254-1
System planning and implementation
This International Standard also specifies spectral densities and a film area which is not to be exposed by the film manufacturer
Aerospace Industry
Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy Ingestion-build-48068 intended to be used together
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