Aluminum Film on Silicon Wafer , 3 microns / 4" -- Al-Si-100-3um ,Si(100) P-type B-doped R:1-20 ohm.cm Anode Surface finish: One side optical

Surface finish:  One side optical polished < 100A

Drum Collector Rotation speed: 100 - 8000 rpm adjustable

The proper separator width should be selected to fit the shanks smoothly and avoid damage to the element

EQ-PCG-2V-LD automatic pressure control system is designed for applications that need controlling constant pressure in a closed system with an in-line flow such as Vacuum Tube Furnaces

Aluminum Film on Silicon Wafer , 3 microns / 4" -- Al-Si-100-3um ,Si(100) P-type B-doped R:1-20 ohm.cm Anode Surface finish: One side opticalAluminum Metallic Film Film coated by E beam evaporation under vacuum below 10 6 torr evaporation rate: 0. 2 nanometer per second Aluminum Thickness: 3 microns Film Resistivity: 2. 65 micro ohm cm Film Crystallinity: Weak (111) oriented polycrystals Roughness, RMS: 4. 87 nm and < 10 nm Silicon Wafer Specifications: Conductive type: Si P type, B doped Resistivity: 1 20 ohm cm Size: 4" diameter + 0. 5 mm x 0. 525 + 0. 025 mm th Orientation: (100) + 0.