Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials Ingestion-build-177197 This standard can also be
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Description
This standard can also be helpful for the equipment intended for use in atmospheres outside the validity range stated above but in this case
Who is PD CEN/TS 17286 for
Classification according to the output voltage
The recommendations are intended to reduce impact related injuries and in particular the risk of cutting and piercing injuries
Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials Ingestion-build-177197 This standard can also beWhat is this standard about? This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the
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